Industrial & Plating Chemicals made in USA
418 curated industrial & plating chemicals products with USA as country of origin, spanning 252 categories and 96 brands. Part of the MPBxChange global sourcing catalog.
Curated catalog of public products — not suppliers who have joined MPBx.
418
PRODUCTS
252
CATEGORIES
96
BRANDS
INDUSTRIAL & PLATING CHEMICALS · USA · 418 PRODUCTS
| BRAND | PRODUCT | CATEGORY |
|---|---|---|
| BASF | Sulfuric Acid | Strong Mineral Acid |
| Sigma-Aldrich | Sulfuric Acid (ACS Reagent Grade) | Strong Mineral Acid |
| Brenntag | Sulfuric Acid | Strong Mineral Acid |
| Brenntag | Sulfuric Acid (Dilute Technical Grade) | Strong Mineral Acid |
| Kanto Chemical | Hydrochloric Acid | Strong Mineral Acid |
| Sigma-Aldrich | Hydrochloric Acid (ACS Reagent Grade) | Strong Mineral Acid |
| Olin | Hydrochloric Acid | Strong Mineral Acid |
| Brenntag | Hydrochloric Acid | Strong Mineral Acid |
| On-site dilution | Hydrochloric Acid | Strong Mineral Acid |
| Kanto Chemical | Nitric Acid | Strong Mineral Acid (Oxidizing) |
| Sigma-Aldrich | Nitric Acid (ACS Reagent Grade) | Strong Mineral Acid (Oxidizing) |
| BASF | Nitric Acid | Strong Mineral Acid (Oxidizing) |
| Brenntag | Nitric Acid | Strong Mineral Acid (Oxidizing) |
| Honeywell | Hydrofluoric Acid | Weak Mineral Acid (Highly Corrosive/Toxic) |
| Local chemical blenders | Hydrofluoric Acid | Weak Mineral Acid (Highly Corrosive/Toxic) |
| Kanto Chemical | Phosphoric Acid | Medium-Strength Mineral Acid |
| ICL | Phosphoric Acid | Medium-Strength Mineral Acid |
| ICL | Phosphoric Acid | Medium-Strength Mineral Acid |
| Brenntag | Phosphoric Acid | Medium-Strength Mineral Acid |
| On-site blending | Phosphoric Acid | Medium-Strength Mineral Acid |
| BASF | Acetic Acid | Organic Carboxylic Acid |
| Sigma-Aldrich | Acetic Acid | Organic Carboxylic Acid |
| Celanese | Acetic Acid | Organic Carboxylic Acid |
| Brenntag | Acetic Acid | Organic Carboxylic Acid |
| Brenntag | Citric Acid | Organic Tricarboxylic Acid |
| Honeywell | Fluoroboric Acid | Fluorinated Mineral Acid |
| Brenntag | Fluoroboric Acid | Fluorinated Mineral Acid |
| On-site preparation | Sulfamic Acid | Inorganic Sulfamic Acid |
| Kanto Chemical | Sodium Hydroxide | Strong Base (Alkali Hydroxide) |
| Sigma-Aldrich | Sodium Hydroxide | Strong Base (Alkali Hydroxide) |
| Dow | Sodium Hydroxide (Technical Grade Flakes) | Strong Base (Alkali Hydroxide) |
| Dow | Sodium Hydroxide | Strong Base (Alkali Hydroxide) |
| Brenntag | Sodium Hydroxide | Strong Base (Alkali Hydroxide) |
| Kanto Chemical | Potassium Hydroxide | Strong Base (Alkali Hydroxide) |
| Sigma-Aldrich | Potassium Hydroxide (ACS Reagent Grade) | Strong Base (Alkali Hydroxide) |
| UNID | Potassium Hydroxide (Technical Grade Flakes) | Strong Base (Alkali Hydroxide) |
| ERCO | Potassium Hydroxide | Strong Base (Alkali Hydroxide) |
| Brenntag | Potassium Hydroxide | Strong Base (Alkali Hydroxide) |
| Kanto Chemical | Ammonium Hydroxide (Aqua Ammonia) | Weak Base (Aqueous Ammonia) |
| Sigma-Aldrich | Ammonium Hydroxide (Aqua Ammonia) | Weak Base (Aqueous Ammonia) |
| BASF | Ammonium Hydroxide (Aqua Ammonia) | Weak Base (Aqueous Ammonia) |
| Local blending | Ammonium Hydroxide (Aqua Ammonia) | Weak Base (Aqueous Ammonia) |
| Solvay | Sodium Carbonate (Soda Ash) | Alkali Salt (Carbonate) |
| Solvay | Sodium Carbonate (Soda Ash) | Alkali Salt (Carbonate) |
| Solvay | Sodium Carbonate (Soda Ash) (Light Technical Grade) | Alkali Salt (Carbonate) |
| Church & Dwight | Sodium Bicarbonate | Alkali Salt (Bicarbonate) |
| Church & Dwight | Sodium Bicarbonate | Alkali Salt (Bicarbonate) |
| Armand Products | Potassium Carbonate | Alkali Salt (Carbonate) |
| Armand Products | Potassium Carbonate | Alkali Salt (Carbonate) |
| Brenntag | Potassium Carbonate (20% Solution Technical) | Alkali Salt (Carbonate) |
| PQ Corporation | Sodium Silicate (Water Glass) | Alkali Silicate |
| PQ Corporation | Sodium Silicate (Water Glass) | Alkali Silicate |
| PQ Corporation | Sodium Silicate (Water Glass) (Powder/Anhydrous Grade) | Alkali Silicate |
| Innophos | Trisodium Phosphate (TSP) | Alkali Phosphate |
| Innophos | Trisodium Phosphate (TSP) | Alkali Phosphate |
| PQ Corporation | Sodium Metasilicate | Alkali Silicate |
| PQ Corporation | Sodium Metasilicate | Alkali Silicate |
| Dow | Monoethanolamine (MEA) | Alkanolamine (Organic Base) |
| Dow | Monoethanolamine (MEA) | Alkanolamine (Organic Base) |
| Dow | Monoethanolamine (MEA) | Alkanolamine (Organic Base) |
| Air Liquide | Ammonia Solution (Anhydrous Ammonia precursor) | Alkali Gas (Aqueous Solution) |
| BASF | Ammonia Solution (30% Technical) | Weak Base (Aqueous Ammonia) |
| Brenntag | Ammonia Solution (15% Technical) | Weak Base (Aqueous Ammonia) |
| Sigma-Aldrich | Copper Sulfate Pentahydrate (ACS Reagent Grade) | Metal Salt (Plating) |
| Vale | Nickel Sulfamate (Electroforming Grade) | Metal Salt (Plating) |
| Coventya | Nickel Sulfamate | Metal Salt (Plating) |
| Sigma-Aldrich | Stannic Chloride (Tin(IV) Chloride) (Technical Grade) | Metal Salt (Plating) |
| Alfa Aesar | Gold(III) Chloride (Auric Chloride) | Metal Salt (Plating) |
| Sigma-Aldrich | Silver Nitrate | Metal Salt (Plating) |
| Thermo Fisher | Silver Nitrate | Metal Salt (Plating) |
| Univertical | Copper Pyrophosphate (Electroplating Grade) | Metal Salt (Plating) |
| Lanxess | Chromium Trioxide (Chromic Acid) | Metal Salt (Plating) |
| Sigma-Aldrich | Lead(II) Acetate Trihydrate | Metal Salt (Plating) |
| Sigma-Aldrich | Copper Methanesulfonate | Metal Salt (Plating) |
| Thermo Fisher | Formaldehyde Solution (10% w/w, PBS buffer) | Electroless Plating Chemical (Reducing Agent) |
| BASF | Dimethylamine Borane (DMAB) | Electroless Plating Chemical (Reducing Agent) |
| Vertellus | Sodium Borohydride | Electroless Plating Chemical (Reducing Agent) |
| Sigma-Aldrich | Sodium Borohydride | Electroless Plating Chemical (Reducing Agent) |
| Sigma-Aldrich | Ethylenediaminetetraacetic Acid (EDTA) | Electroless Plating Chemical (Complexing Agent) |
| Sigma-Aldrich | Sodium Molybdate Dihydrate | Electroless Plating Chemical (Stabilizer) |
| BASF | Sulfuric Acid (Accelerator Dip for Electroless Plating) | Electroless Plating Chemical (Accelerator / pH Adjuster) |
| BASF | Sulfuric Acid | Electroless Plating Chemical (Accelerator / pH Adjuster) |
| UNID | Potassium Hydroxide (Caustic Potash) | Electroless Plating Chemical (pH Adjuster) |
| BASF | Ammonium Hydroxide (Ammonia Solution, 28-30% NH3) | Electroless Plating Chemical (pH Adjuster / Complexant) |
| Corbion | Lactic Acid (2-Hydroxypropanoic Acid) | Electroless Plating Chemical (Complexing Agent) |
| Sigma-Aldrich | Malonic Acid (Propanedioic Acid) | Electroless Plating Chemical (Complexing Agent) |
| Sigma-Aldrich | Lead Acetate Trihydrate (EN Stabilizer Grade) | Electroless Plating Chemical (Stabilizer) |
| BASF | Propionic Acid | Electroless Plating Chemical (Complexing Agent / Buffer) |
| Sigma-Aldrich | Sodium Acetate Trihydrate | Electroless Plating Chemical (Buffer / pH Adjuster) |
| Umicore | Copper(I) Cyanide | Metal Salt (Plating) |
| Sigma-Aldrich | Stannous Chloride Anhydrous | Metal Salt (Plating) |
| Sigma-Aldrich | Boric Acid | Electroless Plating Chemical (Buffer / pH Adjuster) |
| DuPont | Positive Photoresist g-line (AZ 1512) (Semiconductor Grade) | Photoresist (Novolac/DNQ) |
| DuPont | Positive Photoresist g-line (AZ 1518) (Semiconductor Grade) | Photoresist (Novolac/DNQ) |
| DuPont | Positive Photoresist i-line (AZ 5214) (Semiconductor Grade) | Photoresist (Novolac/DNQ) |
| Inpria | Positive Photoresist EUV (13.5nm) - Metal Oxide (EUV Grade) | Photoresist (EUV Metal Oxide) |
| DuPont | Positive Dry Film Photoresist (DFR) - Aqueous Developable (Industrial Grade) | Photoresist (Dry Film) |
| DuPont | Positive Dry Film Photoresist (DFR) - Solvent Developable (Industrial Grade) | Photoresist (Dry Film) |
| MicroChem | Negative Photoresist Liquid (SU-8 2002) (MEMS Grade) | Photoresist (Negative Epoxy) |
| MicroChem | Negative Photoresist Liquid (SU-8 2100) (MEMS Grade) | Photoresist (Negative Epoxy) |
| Merck | Negative Photoresist Liquid (AZ nLOF 2070) (Semiconductor Grade) | Photoresist (Negative) |
| DuPont | Negative Dry Film Photoresist (NDFR) (Industrial Grade) | Photoresist (Negative Dry Film) |
| DuPont | Dry Film Photoresist Aqueous Developable - Standard Grade (Standard PCB Grade) | Photoresist (Dry Film) |
| DuPont | Dry Film Photoresist Aqueous Developable - High Resolution (High Resolution Grade) | Photoresist (Dry Film) |
| DuPont | Dry Film Photoresist Solvent Developable - High Grade | Photoresist (Dry Film) |
| DuPont | Dry Film Photoresist - Multi-layer mSAP Grade (Advanced PCB Grade) | Photoresist (Dry Film) |
| DuPont | Photoresist Developer TMAH 2.38% (Semiconductor Grade) | Quaternary Ammonium Hydroxide |
| DuPont | Photoresist Developer TMAH 2.0% (Semiconductor Grade) | Quaternary Ammonium Hydroxide |
| DuPont | Photoresist Developer TMAH 0.26N (2.4%) (Semiconductor Grade) | Quaternary Ammonium Hydroxide |
| DuPont | Photoresist Developer TMAH 0.12N (1.1%) (VLSI Grade) | Quaternary Ammonium Hydroxide |
| DuPont | Photoresist Developer - Sodium Carbonate Based (PCB) (Industrial Grade) | Inorganic Carbonate |
| DuPont | Photoresist Thinner PGMEA-based (Semiconductor Grade) | Glycol Ether Ester |
| DuPont | Photoresist Thinner - Ethyl Lactate based (Semiconductor Grade) | Ester (Hydroxy acid ester) |
| Dow | Photoresist Thinner - n-Butyl Acetate (Semiconductor Grade) | Ester |
| BASF | Photoresist Remover NMP-based (Semiconductor Grade) | Pyrrolidone (Cyclic Amide) |
| Gaylord Chemical | Photoresist Remover DMSO-based (Semiconductor Grade) | Sulfoxide |
| Chevron Phillips | Photoresist Remover Sulfolane-based (Semiconductor Grade) | Sulfone |
| DuPont | Photoresist Stripper - Aqueous Amine Blend (Semiconductor Grade) | Aqueous Amine Blend |
| DuPont | Edge Bead Remover (EBR) - PGMEA based (Semiconductor Grade) | Glycol Ether Ester |
| DuPont | Edge Bead Remover (EBR) - n-Butyl Acetate (Semiconductor Grade) | Ester |
| DuPont | Edge Bead Remover (EBR) - Ethyl Lactate / Anisole blend (Semiconductor Grade) | Ester/Ether Blend |
| Merck | HMDS Hexamethyldisilazane (Semiconductor Grade) | Silazane (Organosilicon) |
| Merck | HMDS Hexamethyldisilazane (Vapor Prime Grade) (VLSI Grade) | Silazane (Organosilicon) |
| DuPont | Bottom Anti-Reflective Coating (BARC) - Organic (Semiconductor Grade) | Anti-Reflective Coating (Organic) |
| Brewer Science | Bottom Anti-Reflective Coating (BARC) - Silicon-containing (SiBARC) (VLSI Grade) | Anti-Reflective Coating (Silicon-containing) |
| DuPont | Top Anti-Reflective Coating (TARC) (Semiconductor Grade) | Anti-Reflective Coating (Top) |
| DuPont | Inorganic ARC (iARC) - Silicon Oxynitride precursor (Semiconductor Grade) | Anti-Reflective Coating (Inorganic) |
| BASF | Sulfuric Peroxide Mixture (SPM) - 3:1 (Semiconductor Grade) | Acid Oxidizer Mixture |
| DuPont | Photoresist Stripper - NMP/MEA blend heated (Semiconductor Grade) | Amide/Amine Blend |
| DuPont | Adhesion Promoter - Silane Amino (AP3000) (Semiconductor Grade) | Aminosilane |
| Gelest | Adhesion Promoter - Glycidoxypropyltrimethoxysilane (GOPTS) (Semiconductor Grade) | Epoxysilane |
| Merck | Adhesion Promoter - HMDS Vapor Prime (conventional) (Semiconductor Grade) | Silazane |
| DuPont | Contrast Enhancement Material (CEM) - Diazo type (Semiconductor Grade) | Contrast Enhancement Material |
| Brewer Science | Contrast Enhancement Material (CEM) - Reversible Contrast Enhancement (Semiconductor Grade) | Contrast Enhancement Material (Reversible) |
| DuPont (AZ 1300 | Novolak Photoresist (general purpose g-line) (Semiconductor Grade) | Photoresist (Novolac/DNQ) |
| DuPont | Novolak Photoresist (high resolution i-line) (VLSI Grade) | Photoresist (Novolac/DNQ) |
| Hexion | Novolak Resin (dry powder - for formulation) (Photoresist Grade) | Novolac Resin |
| Inpria | Chemically Amplified Resist (CAR) - EUV metal oxide hybrid (EUV Grade) | Photoresist (EUV Metal Oxide Hybrid) |
| MicroChem | Permanent Photoresist - SU-8 (standard MEMS) (MEMS Grade) | Permanent Photoresist (Epoxy) |
| DuPont (Cyclotene 3000 | Permanent Photoresist - Benzocyclobutene (BCB) based (Wafer Grade) | Permanent Photoresist (BCB) |
| DuPont (PI-2000 | Permanent Photoresist - Polyimide (PI) photosensitive (Wafer Grade) | Permanent Photoresist (Polyimide) |
| Merck (AZ 40XT | Thick Photoresist for Electroplating Mold (AZ 40XT) (Plating Grade) | Thick Film Photoresist (Novolac) |
| Merck | Thick Photoresist for Electroplating Mold (AZ nLOF 5510) (Plating Grade) | Thick Film Photoresist (Negative) |
| MicroChem | Thick Photoresist for Electroplating Mold (SU-8 2100 +) (MEMS/Plating Grade) | Thick Film Photoresist (Epoxy) |
| BASF | Ferric Chloride Etchant 38-42% (PCB Grade) | Metal Halide Etchant |
| BASF | Ferric Chloride Etchant 40% - Industrial Grade | Metal Halide Etchant |
| KMG Chemicals | Cupric Chloride Etchant - Acid System (CuCl₂/HCl) (PCB Grade) | Copper Halide Acid Etchant |
| KMG Chemicals | Cupric Chloride Etchant - Alkaline System (CuCl₂/NH₄OH) (PCB Grade) | Copper Halide Alkaline Etchant |
| KMG Chemicals | Alkaline Ammonia Etchant (High pH Cu etch) (PCB Grade) | Alkaline Ammoniacal Etchant |
| KMG | Alkaline Ammonia Etchant - Regenerated (low Cu) | Alkaline Ammoniacal Etchant (Regenerated) |
| KMG Chemicals | Sodium Persulfate Etchant Solution 15-20% (PCB Grade) | Persulfate Etchant |
| PeroxyChem | Sodium Persulfate Solid (crystalline) (Technical Grade) | Persulfate (Solid) |
| KMG | Sodium Persulfate Etchant - Fine Line Grade (Fine Line PCB Grade) | Persulfate Etchant (High Purity) |
| KMG | Ammonium Persulfate Etchant 15-20% (PCB Grade) | Persulfate Etchant |
| PeroxyChem | Ammonium Persulfate Solid (crystalline) (Technical Grade) | Persulfate (Solid) |
| BASF | Chromic Acid Etchant (for polyimide/special alloys) (Industrial Grade) | Hexavalent Chromium Etchant |
| BASF | Nitric Acid Etchant 40-65% (for Ag, Cu specialty) (Industrial Grade) | Mineral Acid (Oxidizing) |
| BASF | Nitric Acid 68-70% (Concentrated, Semiconductor Grade) | Mineral Acid (Oxidizing) |
| BASF | SPM (Sulfuric Peroxide Mixture) 3:1 - Semiconductor Grade (VLSI Grade) | Acid Oxidizer Mixture |
| Avantor | Potassium Hydroxide Etchant 30-45% (KOH) (Semiconductor Grade) | Strong Base (Alkali Hydroxide) |
| Avantor | Potassium Hydroxide Pellets (Semiconductor Grade) | Strong Base (Alkali Hydroxide Solid) |
| Avantor | KOH + IPA Etchant (Anisotropic Si Etch) (Semiconductor Grade) | Alkaline Alcohol Etchant |
| Transene | EDP Etchant Type S (Ethylenediamine + Pyrocatechol + Water) (MEMS Grade) | Amine/Phenol Etchant (Legacy) |
| Linde | Xenon Difluoride (XeF₂) - Dry Etch Precursor (Semiconductor Grade) | Noble Gas Halide |
| MacDermid Alpha | Copper Microetchant (SPS Type - Persulfate/Sulfuric) (PCB Grade) | Copper Microetchant |
| MacDermid Alpha | Copper Etchant - Sodium Persulfate/H₂SO₄ (MEC) (PCB Grade) | Copper Microetchant (Sodium-based) |
| MacDermid Alpha | Copper Etchant - Enthone/OMI CIRCUPOSIT formulation (PCB Grade) | Proprietary Copper Etchant |
| Transene | Aluminum Etchant (Phosphoric/Nitric/Acetic - PAN) (Semiconductor Grade) | Mixed Acid Etchant (Aluminum) |
| Transene | Aluminum Etchant Type A (Transene) (Semiconductor Grade) | Mixed Acid Etchant (Aluminum) |
| BASF | Aluminum Etchant - KOH-based (for Al foils, non-semiconductor) (Industrial Grade) | Strong Base (Aluminum etch) |
| Transene | Gold Etchant - KI/I₂ based (standard) (Semiconductor Grade) | Halogen/Iodide Etchant (Gold) |
| Transene | Silver Etchant (Ferric Nitrate based) (Semiconductor Grade) | Metal Nitrate Etchant (Silver) |
| BASF | Silver Etchant (Nitric Acid based) (Industrial Grade) | Mineral Acid (Silver) |
| Transene | Titanium Etchant (HF/Nitric blend) (Semiconductor Grade) | HF/Nitric Acid Etchant (Titanium) |
| Transene | Tungsten Etchant (Peroxide-based) (Semiconductor Grade) | Peroxide/Acid Etchant (Tungsten) |
| Avantor | Tungsten Etchant (Hot Alkaline Peroxide) (Semiconductor Grade) | Alkaline Peroxide Etchant (Tungsten) |
| Linde | Carbon Tetrafluoride (CF₄) - Plasma Etch Gas | Perfluorocarbon (PFC) |
| Linde | Sulfur Hexafluoride (SF₆) - Plasma Etch Gas | Sulfur Fluoride (PFC-equivalent) |
| Linde | Chlorine (Cl₂) - Plasma Etch Gas | Halogen Gas |
| Linde | Boron Trichloride (BCl₃) - Plasma Etch Gas | Metal Halide Gas |
| Linde | Nitrogen Trifluoride (NF₃) - Plasma Chamber Clean | Nitrogen Fluoride (PFC substitute) |
| Linde | Boron Trifluoride (BF₃) - Plasma Dopant/Etch | Boron Halide Gas |
| Linde | Argon (Ar) - Plasma Etch Carrier/Sputter Gas | Noble Gas |
| BASF | Isopropyl Alcohol | Aliphatic Alcohol |
| BASF | Isopropyl Alcohol | Aliphatic Alcohol |
| BASF | Isopropyl Alcohol (Electronic Grade) | Aliphatic Alcohol |
| Shell | Isopropyl Alcohol (Technical Grade) | Aliphatic Alcohol |
| BASF | Acetone | Ketone |
| BASF | Acetone (Electronic Grade) | Ketone |
| INEOS | Acetone | Ketone |
| BASF | N-Methyl-2-Pyrrolidone | Lactam/Solvent |
| BASF | N-Methyl-2-Pyrrolidone (Electronic Grade) | Lactam/Solvent |
| Dow Chemical | Propylene Glycol Monomethyl Ether Acetate | Glycol Ether Ester |
| Dow | Propylene Glycol Monomethyl Ether Acetate (Electronic Grade) | Glycol Ether Ester |
| Dow | Propylene Glycol Monomethyl Ether | Glycol Ether |
| Dow | Propylene Glycol Monomethyl Ether (Electronic Grade) | Glycol Ether |
| Gaylord Chemical | Dimethyl Sulfoxide (Electronic Grade) | Sulfoxide |
| Fisher Scientific | Methanol (HPLC Grade) | Aliphatic Alcohol |
| Cargill | Ethanol (Absolute) | Aliphatic Alcohol |
| Cargill | Ethanol (Absolute) (Electronic Grade) | Aliphatic Alcohol |
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